Methods of patterning a material

ABSTRACT

Some embodiments include methods of forming openings. For instance, a construction may have a material over a plurality of electrically conductive lines. A plurality of annular features may be formed over the material, with the annular features crossing the lines. A patterned mask may be formed over the annular features, with the patterned mask leaving segments of the annular features exposed through a window in the patterned mask. The exposed segments of the annular features may define a plurality of openings, and such openings may be transferred into the material to form openings extending to the electrically conductive lines.

RELATED PATENT DATA

This patent resulted from a divisional of U.S. patent application Ser.No. 13/491,466, which was filed Jun. 7, 2012, which is now U.S. Pat. No.8,389,407, and which is hereby incorporated herein by reference; whichresulted from a divisional of U.S. patent application Ser. No.12/860,765, which was filed Aug. 20, 2010, which is now U.S. Pat. No.8,216,939, and which is hereby incorporated herein by reference.

TECHNICAL FIELD

Methods of forming openings and methods of patterning a material.

BACKGROUND

Numerous applications exist in which it is desired to form repeatingpatterns having a small pitch (for example, a pitch of less than about82 nanometers). For instance, integrated circuit fabrication may involveformation of a repeating pattern of memory-storage units (e.g., NANDunit cells, dynamic random access memory [DRAM] unit cells, cross-pointmemory unit cells, etc.).

A variety of methods have been developed for creating patterned maskssuitable for patterning underlying materials during fabrication ofintegrated circuit components. A continuing goal of integrated circuitfabrication is to increase integrated circuit density, and accordinglyto decrease the size of individual integrated circuit components. Thereis thus a continuing goal to form patterned masks having increasingdensities of various patterned features.

There can be particular difficulties in forming suitable masks forpatterning openings to make contacts to tightly packed circuitry (forexample, for patterning contact openings to the various circuit linesassociated with NAND or other memory), and the difficulties are becomingever more challenging with increasing levels of integration.Accordingly, it is desirable to develop new methods for patterningcontact openings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1 and 2 are a diagrammatic top view and a diagrammaticcross-sectional side view, respectively, of a semiconductor constructionat a processing stage of an example embodiment. The view of FIG. 2 isalong the line 2-2 of FIG. 1.

FIGS. 3 and 4 are a diagrammatic top view and a diagrammaticcross-sectional side view, respectively, of the construction of FIGS. 1and 2 shown at processing stage subsequent to that of FIGS. 1 and 2. Theview of FIG. 4 is along the line 4-4 of FIG. 3.

FIGS. 5 and 6 are a diagrammatic top view and a diagrammaticcross-sectional side view, respectively, of the construction of FIGS. 1and 2 shown at processing stage subsequent to that of FIGS. 3 and 4. Theview of FIG. 6 is along the line 6-6 of FIG. 5.

FIGS. 7 and 8 are a diagrammatic top view and a diagrammaticcross-sectional side view, respectively, of the construction of FIGS. 1and 2 shown at processing stage subsequent to that of FIGS. 5 and 6. Theview of FIG. 8 is along the line 8-8 of FIG. 7.

FIGS. 9 and 10 are a diagrammatic top view and a diagrammaticcross-sectional side view, respectively, of the construction of FIGS. 1and 2 shown at processing stage subsequent to that of FIGS. 7 and 8. Theview of FIG. 10 is along the line 10-10 of FIG. 9.

FIGS. 11 and 12 are a diagrammatic top view and a diagrammaticcross-sectional side view, respectively, of the construction of FIGS. 1and 2 shown at processing stage subsequent to that of FIGS. 9 and 10.The view of FIG. 12 is along the line 12-12 of FIG. 11.

FIGS. 13 and 14 are a diagrammatic top view and a diagrammaticcross-sectional side view, respectively, of the construction of FIGS. 1and 2 shown at processing stage subsequent to that of FIGS. 11 and 12.The view of FIG. 14 is along the line 14-14 of FIG. 13.

FIGS. 15 and 16 are a diagrammatic top view and a diagrammaticcross-sectional side view, respectively, of the construction of FIGS. 1and 2 shown at processing stage subsequent to that of FIGS. 13 and 14.The view of FIG. 16 is along the line 16-16 of FIG. 15.

FIGS. 17-19 are diagrammatic top views of a semiconductor constructionat various process stages of another example embodiment.

FIGS. 20-22 are diagrammatic top views of a semiconductor constructionat various process stages of another example embodiment.

FIGS. 23-25 are diagrammatic top views of a semiconductor constructionat various process stages of another example embodiment.

DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS

Some embodiments are directed toward processes of forming tightly-packedpatterns of openings through the utilization of two overlappingpatterned masks. One of the patterned masks may comprise features formedutilizing pitch-multiplication methodologies so that such features maycomprise dimensions smaller than can be obtained utilizingphotolithography alone.

Some embodiments are directed toward semiconductor constructions whichmay be formed and utilized in some of the example embodiment processesof forming openings; such as constructions comprising two overlappingmasks that together define a pattern of openings over a semiconductorsubstrate.

Example embodiments are described with reference to FIGS. 1-22; withFIGS. 1-16 illustrating a first example embodiment process, FIGS. 17-19illustrating a second example embodiment process, FIGS. 20-22illustrating a third example embodiment process, and FIGS. 23-25illustrating a fourth example embodiment process.

Referring to FIGS. 1 and 2, a semiconductor construction 10 is shown intop view (FIG. 1) and cross-sectional side view (FIG. 2). Theconstruction comprises a semiconductor base 12, a plurality ofelectrically conductive structures 1-8 formed over the base, and aplurality of materials 14, 16, 18 and 20 formed over the electricallyconductive structures.

The semiconductor base 12 may comprise, consist essentially of, orconsist of monocrystalline silicon, and may be referred to as asemiconductor substrate, or as a portion of a semiconductor substrate.The terms “semiconductive substrate,” “semiconductor construction” and“semiconductor substrate” mean any construction comprisingsemiconductive material, including, but not limited to, bulksemiconductive materials such as a semiconductive wafer (either alone orin assemblies comprising other materials), and semiconductive materiallayers (either alone or in assemblies comprising other materials). Theterm “substrate” refers to any supporting structure, including, but notlimited to the semiconductive substrates described above. Although base12 is shown to be homogenous, the base may comprise numerous layers insome embodiments. For instance, base 12 may correspond to asemiconductor substrate containing one or more layers associated withintegrated circuit fabrication. In such embodiments, such layers maycorrespond to one or more of refractory metal layers, barrier layers,diffusion layers, insulator layers, etc.

Electrically conductive structures 1-8 are illustrated to be lines thatextend in and out of the page relative to the cross-sectional view ofFIG. 2; and specifically that are elongated along a direction parallelto an axis 15 (shown in FIG. 1). Such lines are shown in dashed-line(phantom) view in FIG. 1 to indicate that they are beneath othermaterials.

Some aspects of the invention pertain to methodology which may beutilized to form contact openings to an underlying level of circuitry orother underlying pattern during integrated circuit fabrication. Theillustrated lines are an example of conductive structures that may beformed along a level of integrated circuitry. In the shown embodimentthe lines 1-8 are at the same elevational level as one another. In otherembodiments one or more of the lines may be at an elevational level thatis above or below others of the lines. The lines 1-8 may be bitlines,wordlines or shallow trench isolation patterns in some embodiments.

The lines 1-8 are formed to a pitch P₁. In some embodiments P₁ may be asub-lithographic pitch formed utilizing pitch multiplicationtechnologies; such as, for example, pitch doubling technologies. Examplepitch multiplication technologies are described in U.S. Pat. No.5,328,810.

The material 14 that extends over and between the electricallyconductive lines is electrically insulative material. Such material maybe a silicon oxide-containing material; such as, for example, silicondioxide, borophosphosilicate glass (BPSG), phosphosilicate glass (PSG),etc. In the shown embodiment material 14 is a single thick material overthe lines 1-8. In other embodiments there may be multiple materials overand between the lines in addition to, or alternatively to, the thickmaterial 14.

Material 16 is a carbon-containing material, and in some embodiments maycomprise, consist essentially of, or consist of one or both of amorphouscarbon and transparent carbon. The carbon-containing material 16 isshown to be directly against the insulative material 14. In otherembodiments, there may be one or more layers provided between materials14 and 16. For example, a silicon nitride-containing layer may beprovided between materials 14 and 16.

Material 18 is hardmask. In some embodiments material 18 may correspondto a deposited antireflective coating (DARC); and thus may comprise,consist essentially of, or consist of silicon oxynitride.

Material 20 is a masking material, and in some embodiments may comprise,consist essentially of, or consist of photoresist.

Referring to FIGS. 3 and 4, masking material 20 is patterned into aplurality of lines 22-25. The masking material lines 22-25 are parallelto one another. The lines 22-25 extend primarily along a directionparallel to an axis 17. In some embodiments the axis 15 along which theconductive lines 1-8 primarily extend may be referred to as a first axisand the axis 17 may be referred to as a second axis which intersects thefirst axis. The second axis 17 intersects the first axis 15 at an angleθ (theta). The angle θ may be less than 90° in some embodiments, lessthan 45° in some embodiments, and in the shown embodiment is about 27°.

Each of the individual lines 22-25 has a width 27 corresponding to about½P₁ cos(θ). In embodiments in which masking material 20 comprisesphotoresist, and in which the pitch P₁ is sub-lithographic, the lines22-25 can be formed to the sub-lithographic width 27 by firstphotolithographically forming the lines to an initial lithographic widthand then chemically trimming the lines to reduce the width to a desiredsub-lithographic width, or by overexposure.

Referring to FIGS. 5 and 6, a layer of material 28 is formed over lines22-25. The material 28 is ultimately utilized to form spacers (discussedbelow with reference to FIGS. 7 and 8), and accordingly may be formed toabout a desired width of such spacers. In the shown embodiment, material28 is formed to a thickness 29 which is about the same as the widths 27(FIG. 3) of the individual lines 22-25. Material 28 may comprise anysuitable material, and in some embodiments may comprise, consistessentially of, or consist of silicon dioxide. It may be desired thatmaterial 28 be selectively etchable relative to materials 20 and 18 insome embodiments. The lines 22-25 are shown in dashed line in the topview of FIG. 5 to indicate that such lines are beneath material 28.

Material 28 may be formed by any suitable method, including, forexample, one or both of atomic layer deposition (ALD) and chemical vapordeposition (CVD).

Referring to FIGS. 7 and 8, material 28 is anisotropically etched toform spacers 30 around the lines 22-25. In the shown embodiment thespacers form a plurality of annular rings 32-35, with each individualring being around one of the lines 22-25.

The rings 32-35 are shown to be rectangular, and to be elongated alongthe direction of axis 17. Thus, each of the individual rings has twolong sides 39 (shown relative to ring 34 in FIG. 7), and two short sides41 (also shown relative to ring 34 in FIG. 7). Each of the long sidesand short sides is a single straight segment in the shown embodiment. Inother embodiments the annular rings may have other shapes, such as othershapes elongated along axes 17. Such other shapes may have long sidesand short sides analogous to the shown rectangular-shaped rings, but atleast some of the long sides and/or short sides may have a differentconformation then the shown single straight segments (for instance, twoor more of the sides may be wavy).

In the shown embodiment the long segments 39 of ring 34 are straightsegments that extend along the second axis 17. In embodiments in whichthe long segments are not straight (for instance, embodiments in whichthe long segments are curved or wavy), the long segments may beconsidered to extend primarily along the second axis 17.

Referring to FIGS. 9 and 10, masking material 20 (FIGS. 7 and 8) isremoved to leave openings 42-45 within the annular rings 32-35,respectively. In the shown embodiment openings 42-45 arerectangular-shaped and have the width 27 of the masking material lines22-25 (shown in FIG. 3). The spacers 30 have widths 29 corresponding toabout the initial thickness of material 28 (shown in FIG. 6). In theshown embodiment widths 27 and widths 29 are about the same as oneanother, and are both about ½P₁ cos(θ). Accordingly, the spacers 30 forma repeating pattern that has a pitch of P₂, with P₂ being about P₁cos(θ). The repeating pattern formed by spacers 30 at pitch P₂ is alongan axis orthogonal to the axis 17 along which the rings 32-35 arealigned.

Referring to FIGS. 11 and 12, a patterned masking material 50 isprovided over rings 32-35. The patterned masking material 50 has atrench 52 extending therethrough. The shown trench is rectangular andelongated along a direction parallel to an axis 19 which is orthogonalto the axis 15. The trench 52 thus extends perpendicularly to thedirection along which the lines 1-8 are elongated. The shown trench isan example configuration, and other configurations may be used in otherembodiments. In the example embodiment of FIGS. 11 and 12 the trench mayhave any suitable shape which provides one contact per conductive line1-8.

The rings 32-35 are shown in dashed line in the top view of FIG. 11 toindicate that the rings are beneath masking material 50, except forregions of the rings exposed within trench 52.

Masking material 50 may comprise any suitable composition, and in someembodiments may comprise, consist essentially of, or consist ofphotolithographically patterned photoresist. In some embodiments, therings 32-35 may be considered to form a first patterned mask, and themasking material 50 may be considered to form a second patterned maskoverlying the first patterned mask.

The trench 52 exposes some regions of rings 32-35, while covering otherregions of the rings. The exposed regions have a plurality of openings61-68 that extend down to the material 18. Thus, the patterned maskingmaterial 50 and rings 32-35 may be together considered to define aplurality of openings 61-68.

In the shown embodiment each space within the interior of rings 32-25,and each of the spaces between adjacent rings, patterns a single one ofthe openings 61-68.

In the shown embodiment the masking material 20 (FIGS. 5 and 6) isremoved prior to forming patterned masking material 50. In otherembodiments masking material 20 may remain within rings 32-35 as maskingmaterial 50 is provided over the rings. In some embodiments, materials20 and 50 may be the same composition as one another (for instance, mayboth comprise photoresist), and accordingly material 20 may be removedfrom within openings 61-68 during the same processing step utilized toform trench 52. Thus, if materials 20 and 50 are the same composition asone another, the processing of FIGS. 9 and 10 may be omitted in someembodiments, and instead portions of material 20 exposed within trench52 may be removed during the processing utilized to form the trench 52.

In some embodiments materials 20 and 50 may be different from oneanother, and material 20 may remain within rings 32-35 to change a pitchof the openings formed at the processing stage of FIGS. 11 and 12.Specifically, if material 20 remains at the processing stage of FIGS. 11and 12, then only openings 61, 63, 65 and 67 may be formed, which mayeffectively increase a pitch of the openings by a factor of 2 relativeto embodiments in which all of the openings 61-68 are formed. Suchincreased pitch may be desired in some applications. Methods for leavingmaterial 20 between spacers to accomplish an increased pitch arediscussed in more detail below with reference to FIGS. 20-22.

Referring to FIGS. 13 and 14, openings 61-68 are transferred intomaterials 14 and 16 with one or more suitable etches, and materials 18,28 and 50 (FIGS. 11 and 12) are removed. In some embodiments theopenings 61-68 may be initially transferred into hardmask material 18,then materials 28 and 50 may be removed from over the hardmask, then theopenings are transferred from hardmask material 18 into underlyingmaterials 14 and 16 with one or more suitable etches, and then thehardmask material 18 is removed.

The openings 61-68 extend to conductive lines 1-8 at the processingstage of FIGS. 13 and 14, and thus are contact openings to the lines.

Referring to FIGS. 15 and 16, electrically conductive material 70 isformed within openings 61-68 to form electrically conductive contactsextending to the lines 1-8. The conductive material may be left as is toelectrically interconnect all of lines 1-8 to one another.Alternatively, in subsequent processing (not shown) the conductivematerial 70 may be removed from an upper surface of construction 10 toform a plurality of separate contacts to the various conductive lines.The material 70 may be removed from over the top of construction 10 withany suitable processing; such as, for example, chemical-mechanicalprocessing (CMP).

The rings 32-35 of the embodiment of FIGS. 1-16 are one of manyconfigurations of rings that may be utilized in various embodiments.FIGS. 17-19 illustrate another configuration of rings that may beutilized in some embodiments. Similar numbering will be used to describeFIGS. 17-19 as was used above in describing FIGS. 1-16, whereappropriate.

Referring to FIG. 17, a semiconductor construction 10 a is shown in topview. The semiconductor construction may comprise lines analogous tolines 1-8 described above with reference to FIGS. 1-16 (such lines arenot shown in the top view of FIG. 20), and may comprise the variousmaterials 14, 16 and 18 described with reference to the cross-sectionalview of FIG. 2. The construction 10 a comprises the patterned material20 forming a plurality of structures (two of which are labeled as 80 and81), and comprises anisotropically-etched spacer material 28 formingspacers 30 around the structures of material 20. The spacers 30 form apair of rings 82 and 83 encircling the structures 80 and 81,respectively.

Each of the structures 80 and 81 is of the same shape. Such shape isdescribed relative to structure 80. The shape has a first linear segment90, a second linear segment 92 laterally offset from the first linearsegment, and a jog 94 connecting the first and second linear segments toone another. The first and second linear segments are parallel to oneanother.

The structures 80 and 81 define interior regions of the rings 82 and 83;and accordingly the interior regions of the rings may be considered tocomprise linear segments and jogs analogous to the linear segments andjogs of the structures 80 and 81.

The structure 80 has a width 85. A center of the first linear segment 90is laterally offset from a center of the second linear segment 92 by adistance 87 (shown relative to structure 81). In the shown embodiment,the distance 87 is about the same as the width 85. Also, the rings 82and 83 are spaced from one another by a distance 89, and in the shownembodiment distance 89 is the same as the distance 87.

Referring to FIG. 18, structures 80 and 81 are removed, and a patternedmasking material 100 is provided over rings 82 and 83. The patternedmasking material 100 may comprise, for example, photoresist.

The patterned masking material has a pair of trenches 102 and 104extending therethrough. The patterned masking material 100, togetherwith rings 82 and 83 defines a plurality of openings across an uppersurface of construction 10 a (some of the openings are labeled as110-117 in FIG. 18). The openings are arranged in two rows, with one ofthe rows comprising the openings 110-113 defined within trench 102, andthe other of the rows comprising the openings 114-117 defined withintrench 104.

Referring to FIG. 19, the openings 110-117 are extended into thematerial 18 underlying rings 82 and 83 (FIG. 18); and subsequently themasking material 100 (FIG. 18), and the rings 82 and 83, are removed.The openings may be extended into silicon dioxide-containing material,carbon-containing material, and hardmask material analogous to thematerials 14, 16 and 18 of FIG. 2; and are shown extending to acarbon-containing material 16.

As discussed above with reference to the processing of FIGS. 11 and 12,there may be embodiments in which it is desired to leave patternedmaterial within masking material rings so that openings are only formedin the locations of spaces between the rings. FIGS. 20-22 show anexample embodiment utilizing such processing. Similar numbering will beused to describe FIGS. 20-22 as was used above in describing FIGS. 1-16,where appropriate.

Referring to FIG. 20, a semiconductor construction 10 b is shown in topview. The semiconductor construction may comprise lines analogous to thelines 1-8 described above with reference to FIGS. 1-16 (such lines arenot shown in the top view of FIG. 20), and may comprise the variousmaterials 14, 16 and 18 described with reference to the cross-sectionalview of FIG. 2. The construction 10 b is shown comprising the material18 as a surface supporting various masking structures.

The construction 10 b comprises a patterned material 190 forming threerectangular features 200-202, and comprises anisotropically-etchedspacer material 28 forming spacers 30 around the features 200-202. Thespacers 30 form rings 210-212 encircling the features 200-202,respectively. The patterned material 190 may comprise photoresist, ormay comprise any other suitable composition. The rings are separatedfrom one another by spaces 214 and 216; and additional spaces 213 and217 are along illustrated outside edges of rings 210 and 212,respectively.

In some embodiments the photoresist 190 may be considered to be a firstpatterned mask comprising a plurality of spaced apart first features200-202. The first features are linear in the shown embodiment, with thefeatures being rectangular lines in the shown view. The features 200-202are parallel to one another, and are spaced from one another by adistance 191. The features 200-202 are on a first pitch 195.

The rings 210-212 may be considered to be formed around lateralperipheries of the first features. Since the first features can remainwithin the rings during a subsequent patterning step, the first featuresand rings may be together considered to form second masking features200/210, 201/211 and 202/212 in the shown embodiment. Such secondmasking features may be considered to be spaced-apart second linearfeatures, which are separated from one another by a distance 193 whichis less than the distance 191. The distance 193 will ultimately definewidths of a plurality of openings, as discussed below.

In the shown embodiment the spacers 30, features 200-202, and spaces 214and 216, all have the same width “X.” In other embodiments, the widthsof one or more of spaces 213-217 may be tailored to other dimensions.For example, the widths of spaces 213-217 may be tailored by modifyingthe thickness of spacer material 28. Thicker spacer material will leadto smaller spaces, and thinner spacer material will lead to largerspaces.

Referring to FIG. 21, patterned masking material 220 is formed overfeatures 200-202 and rings 210-212. The masking material has a trench222 extending therethrough, with such trench exposing segments of thefeatures 200-202 and rings 210-212. The masking material 220 comprises acomposition which can be selectively removed relative to the material 28of the rings, and the material 190 of the features 200-202. In someembodiments masking material 220 comprises, consists essentially of, orconsists of photoresist.

The trench 222, together with the rings 210-212 and features 200-202,defines a plurality of openings 230-234; with each opening being in alocation of one of the spaces 213-217 (FIG. 20). Since the openings arein locations of the spaces 213-217, and the widths of such spaces may betailored with the thickness of spacer material 28; the widths ofopenings 213-217 may also be tailored with the thickness of spacermaterial 28.

Referring to FIG. 22, openings 230-234 are transferred into underlyingmaterial 18, and the features 200-202 and rings 210-212 (FIG. 21) areremoved from over material 18. The openings are on a pitch 197 that isthe same as the pitch 195 that the features 200-202 were on (FIG. 20) inthe shown embodiment, but are offset from the edges of the features200-202 by the widths of the rings 210-212. It may be useful to havesuch offset of the openings relative to the original location of thefirst masking features 200-202 in applications in which it is desired toline up the openings with underlying components that would also beoffset relative to the masking features.

FIGS. 23-25 show another example embodiment process.

Referring to FIG. 23, a semiconductor construction 300 is shown tocomprise a plurality of spaced-apart features 302 of patterned maskingmaterial 304; and to comprise gaps 306 between the spaced-apartfeatures. The features 302 may correspond to portions of rings (such asthe rings 32-35 of FIG. 9) in some embodiments. The gaps 306 extendthrough the masking material to expose an upper surface of a substrate308. The substrate may comprise any of numerous structures; and in someembodiments may comprise lines analogous to the lines 1-8 describedabove, and may comprise various materials analogous to the materials 14,16 and 18 described above. The patterned features 302 may be consideredto correspond to a first patterned mask 305 formed over the substrate302.

Referring to FIG. 24, a patterned masking material 310 is formed overthe patterned features 302. The patterned masking material 310 may beconsidered to correspond to a second patterned mask 307. The secondpatterned mask has a pair of spaced-apart windows 312 and 314 extendingtherethrough (regions of features 302 of the first mask that are outsideof the windows are illustrated with dashes to indicate that they arebeneath masking material 310). The first and second patterned masks 305and 307 together define a plurality of openings 350-357 extending tosubstrate 308. It is noted that openings 353 and 354 are formed from thesame gap in the first mask 305 (FIG. 23), but from different windows inthe second mask 307.

Referring to FIG. 25, the openings 350-357 are extended into thesubstrate with one or more suitable etches, and the first and secondpatterned masks 305 and 307 (FIG. 24) are removed. In some embodimentsthe openings 350-357 can be contact openings, with each of said openingsextending to a separate electrically conductive structure withinsubstrate 308.

The embodiments discussed above may be utilized in forming componentswhich may be incorporated into electronic systems. Example electronicsystems are computers, cars, airplanes, clocks, cellular phones, etc.Example components which may be formed with the processing describedherein are memory structures, such as, for example, flash memorystructures.

The particular orientation of the various embodiments in the drawings isfor illustrative purposes only, and the embodiments may be rotatedrelative to the shown orientations in some applications. The descriptionprovided herein, and the claims that follow, pertain to any structuresthat have the described relationships between various features,regardless of whether the structures are in the particular orientationof the drawings, or are rotated relative to such orientation.

The cross-sectional views of the accompanying illustrations only showfeatures within the planes of the cross-sections, and do not showmaterials behind the planes of the cross-sections in order to simplifythe drawings.

When an element is referred to as being “on” or “against” anotherelement, it can be directly on the other element or intervening elementsmay also be present. In contrast, when an element is referred to asbeing “directly on,” or “directly against” another element, there are nointervening elements present. When an element is referred to as being“connected” or “coupled” to another element, it can be directlyconnected or coupled to the other element or intervening elements may bepresent. In contrast, when an element is referred to as being “directlyconnected” or “directly coupled” to another element, there are nointervening elements present.

In compliance with the statute, the subject matter disclosed herein hasbeen described in language more or less specific as to structural andmethodical features. It is to be understood, however, that the claimsare not limited to the specific features shown and described, since themeans herein disclosed comprise example embodiments. The claims are thusto be afforded full scope as literally worded, and to be appropriatelyinterpreted in accordance with the doctrine of equivalents.

We claim:
 1. A method of patterning a material, comprising: forming afirst patterned mask over the material, the first patterned maskcomprising a plurality of spaced-apart first features, the spaced-apartfirst features having lateral peripheries; the first features beingparallel to one another and being spaced from one another by a firstdistance; forming spacers around the lateral peripheries of the spacedapart first features; the spacers and first features together formingspaced apart second features of a second patterned mask; the secondfeatures being spaced from one another by a second distance which isless than the first distance; forming a third patterned mask over thesecond patterned mask; the third patterned mask having a trenchextending therethrough to exposed segments of the second features; thesecond and third patterned masks together defining a plurality ofopenings; and transferring the openings into the material.
 2. The methodof claim 1 wherein the spacers comprise silicon dioxide; and wherein oneof the first and second patterned masks comprises photoresist.
 3. Themethod of claim 1 wherein the material is an oxide-containing material.4. The method of claim 1 wherein the material is a carbon-containingmaterial.
 5. The method of claim 1 wherein the transferring of theopenings into the material forms contact openings that extend throughthe material to upper surfaces of electrically conductive lines.
 6. Amethod of patterning materials, comprising: forming a first patternedmask over the materials, the first patterned mask comprising a pluralityof spaced-apart first features, the spaced-apart first features havinglateral peripheries; the first features being parallel to one anotherand being spaced from one another by a first distance; forming spacersaround the lateral peripheries of the spaced apart first features; thespacers and first features together forming spaced apart second featuresof a second patterned mask; the second features being spaced from oneanother by a second distance which is less than the first distance;forming a third patterned mask over the second patterned mask; the thirdpatterned mask having a trench extending therethrough to exposedsegments of the second features; the second and third patterned maskstogether defining a plurality of openings; and transferring the openingsinto the materials; wherein the materials comprise oxide-containingmaterial over carbon-containing material.
 7. The method of claim 6wherein the spacers comprise silicon dioxide; and wherein one of thefirst and second patterned masks comprises photoresist.